[ Article ]

Journal of the Korean Society of Manufacturing Technology Engineers - Vol. 27, No. 1, pp.57-62

ISSN: 2508-5107 (Online)

Print publication date 15 Feb 2018

Received 01 Dec 2017 Revised 12 Dec 2017 Accepted 18 Dec 2017

DOI: https://doi.org/10.7735/ksmte.2018.27.1.57

전해에칭 보호 마스크로 활용하기 위한 도금층의 레이저 패터닝

신홍식^a^{, *}

Laser Patterning of Deposited Layer for Protective Mask in Electrochemical Etching

Hong Shik Shin^a^{, *}

aSchool of Mechanical, Automotive and Aeronautical Engineering, Korea National University of Transportation, 50, Daehak-ro, Geomdan-ri, Daesowon-myeon, Chungju, Chungbuk-do, 27469, Korea

Correspondence to: ^*Tel.: +82-43-841-5287, Fax: +82-43-841-5280, E-mail address: shinhs05@ut.ac.kr (Hong Shik Shin).

Abstract

A through-mask electrochemical etching process involves a selective metal removal process from unprotected areas of a patterned workpiece. A protective mask such as a photo-mask is used in through-mask electrochemical etching. The deposited layer with micro patterns can be fabricated by laser beam irradiation. The deposited layer with micro patterns can act as a protective mask during electrochemical etching. The characteristics of deposited layer with micro patterns are investigated according to the electrodeposition and laser beam conditions. The experimental results were observed by SEM (scanning electron microscope), EDS (energy dispersive spectrometry), and surface profile analysis. Consequently, selective electrochemical etching using the deposited layer was successfully achieved.

Keywords:

Laser patterning, Deposited layer, Protective mask, Electrochemical etching, Copper layer

Acknowledgments

이 성과는 2017년도 정부(과학기술정보통신부)의 재원으로 한국연구재단의 지원을 받아 수행된 연구임(No. NRF-2017R1C1B1005444).

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