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한국생산제조학회 학술지 영문 홈페이지
[ Best Paper of This Month ]
Journal of the Korean Society of Manufacturing Technology Engineers - Vol. 28, No. 2, pp.71-78
ISSN: 2508-5107 (Online)
Print publication date 15 Apr 2019
Received 14 Jan 2019 Revised 19 Feb 2019 Accepted 15 Feb 2019
DOI: https://doi.org/10.7735/ksmte.2019.28.2.71

디스플레이 공정용 수계 박리액의 포토레지스트박리 조건 최적화 및 환경성 연구

이기성a ; 오홍준a ; 김용성a, *
Optimization of Photoresist Stripping Condition and Environmental Characteristics of Aqueous Stripper for Display Process
Ki-Seong Leea ; Hong Jun Oha ; Young Sung Kima, *
aGraduate School of NID Fusing Technology, Seoul National University of Science & Technology 232 Gongneung-ro, Nowon-gu, Seoul 01811, Korea

Correspondence to: *Tel.: +82-2-970-6804 Fax: +82-2-970-6011 E-mail address: youngsk@seoultech.ac.kr (Young Sung Kim).

Abstract

In this research, we investigate an aqueous stripper to replace organic strippers. In order to ensure cleanliness of the aqueous stripper, optimization of the water content ratio and the process conditions were studied. The stripping characteristics of the PR coated ITO layer on the glass substrate, which depends on the water content, temperature, and fluidic velocity of the stripper was examined and compared. The stripping performance was evaluated through the PR residual amount and optical characteristics of the stripped sample. The stripping condition was optimized for the maximum water content of 74.5% in the fluidic process and stripping time of 50 sec at the minimum temperature of 40°C. Also, the cleanliness of the aqueous stripper was analyzed and compared with the organic and aqueous stripping processes with LCA.

Keywords:

Aqueous stripper, Photo-lithography, Cyclodextrin, Photoresist, Stripping process, Swelling

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