Fabrication and Performance Tests of an Ultrasonic Cleaning System for Solar-cell Wafers
Abstract
In this study, a midsonic cleaning system for solar-cell wafers with a frequency of 750 kHz was designed and fabricated. Finite element analysis was used to design the system. The obtained peak admittance value was 750.0 kHz. Reflecting the analysis results, the system was fabricated and its admittance characteristic was measured. The measured data showed 753.1 kHz, a value that was consistent with the finite element method (FEM) result with 0.4% error. The acoustic pressure test was performed and the resulting pressures were found to range from 283% to 328%, with a standard deviations range from 36.8% to 39.2%. Then, the wafer damage test was performed, and no damage was observed. Finally, the particle-cleaning test was performed; when we applied 1100 W, 99.8% of particles were removed. These results indicate that the developed midsonic bath has the capability of cleaning effectively without inflicting wafer breakage.
Keywords:
Ultrasonic, Wave, Finite element method (FEM), Cleaning, Solar-cell waferAcknowledgments
This research was supported by the Technology and Information Promotion Agency (TIPA), under the Korea government Ministry of Small and Medium-sized Enterprises (SMEs) and Startups. Additionally, it was also supported by the Fundamental Research Project (NK219B) of the Energy Systems Research Division at the Korea Institute of Machinery and Materials.
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