Finite Element Analysis and Fabrication of a 3 MHz Megasonic System for Semiconductor Cleaning
Abstract
Megasonic cleaning has been used to clean contaminants from wafer surfaces in semiconductor production. This research developed a 3 MHz megasonic waveguide for cleaning processes in semiconductor industries. Firstly, a 1 MHz type was fabricated in aluminum (Al) and quartz, consisting of a lead zirconate titanate (PZT) actuator and a waveguide. A 3 MHz quartz waveguide was also fabricated based on the fabricated results, and its performance was tested. In the design process, finite element analysis was performed. As a result, the predicted value was 2.997 MHz, which agreed with the measured value of 2.995 MHz with a 0.1% error. Lastly, a particle removal efficiency (PRE) test was performed, and the results showed that 93.1% PRE was achieved at 8W power. Considering the acoustic pressure and the cleaning test results, the 3 MHz megasonic may help the removal of contaminants from wafer surfaces effectively.
Keywords:
Megasonic, Cleaning, Finite element method(FEM), Waveguide, Piezoelectric actuatorAcknowledgments
This research was supported by the Korea Evaluation Institute of Industrial Technology (KEIT), under the Korea government Ministry of Knowledge Economy and by a research project (NK237C) of the Korea Institute of Machinery and Materials (KIMM).
References
- Kanegsberg, B., Kanegsberg, E., 2000, Handbook for Critical Cleaning, CRC Press, Boca Raton, U.S.A.. [https://doi.org/10.1201/9781420039825]
- Liu, Y., Geng, D., Shao, Z., Zhou, Z., Jiang, X., Zhang, D., 2021, A Study on Strengthening and Machining Integrated Ultrasonic Peening Drilling of Ti-6Al-4V, Materials & Design, 212 110238. [https://doi.org/10.1016/j.matdes.2021.110238]
- Kim, H., Lim, E., Lee, Y., Park, J.-K., 2019, Fabrication and Performance Tests of an Ultrasonic Cleaning System for Solar-cell Wafers, J. Korean Soc. Manuf. Technol. Eng., 28:4 210-217. [https://doi.org/10.7735/ksmte.2019.28.4.210]
- Kim, H., Lim, E., Park, J.-K., 2017, Development of a 20 kHz Ultrasonic System for Nano-surface Reformation Process, J. Korean Soc. Manuf. Technol. Eng., 26:4 365-370. [https://doi.org/10.7735/ksmte.2017.26.4.365]
- Su, H., Shen, X., Xu, C., He, J., Wang, B., Su, G., 2020, Surface Characteristics and Corrosion Behavior of TC11 Titanium Alloy Strengthened by Ultrasonic Roller Burnishing at Room and Medium Temperature, J. Mater. Res. Technol., 9:4 8172-8185. [https://doi.org/10.1016/j.jmrt.2020.05.059]
- Yang, X., Yang, X., Gu, H., Kawai, K., Arima, K., Yamamura, K., 2022, Efficient and Slurryless Ultrasonic Vibration Assisted Electrochemical Mechanical Polishing for 4H–SiC Wafers, Ceram. Int., 48:6 7570-7583. [https://doi.org/10.1016/j.ceramint.2021.11.301]
- Li, H., Chen, T., Duan, Z., Zhang, Y., Li, H., 2022, A Grinding Force Model in Two-dimensional Ultrasonic-assisted Grinding of Silicon Carbide, J. Mater. Process Technol., 304 117568. [https://doi.org/10.1016/j.jmatprotec.2022.117568]
- Ni, Z. L., Liu, Y., Wang, Y. H., He, B. Y., 2022, Interfacial Bonding Mechanism and Fracture Behavior in Ultrasonic Spot Welding of Copper Sheets, Materials Science and Engineering: A, 833 142536. [https://doi.org/10.1016/j.msea.2021.142536]
- Kim, H., Lee, Y., Lim, E., 2009, Design and Fabrication of an L-type Waveguide Megasonic System for Cleaning of Nano-scale Patterns, Curr. Appl. Phys., 9:2 e189-e192. [https://doi.org/10.1016/j.cap.2008.12.058]
- Kim, H., Lee, Y., Lim, E., 2013, Design and Fabrication of a Horn-type Megasonic Waveguide for Nanoparticle Cleaning, IEEE Trans. on Semiconductor Manufacturing, 26:2 221-225. [https://doi.org/10.1109/TSM.2013.2238563]
- Keswani, M., Raghavan, S., Deymier, P., 2013, A Novel Way of Detecting Transient Cavitation Near a Solid Surface during Megasonic Cleaning using Electrochemical Impedance Spectroscopy, Microelectron. Eng., 108 11-15. [https://doi.org/10.1016/j.mee.2013.02.097]
- Hauptmann, M., Brems, S., Camerotto, E., Zijlstra, A., Doumen, G., Bearda, T., Mertens, P.W., Lauriks, W., 2010, Influence of Gasification on the Performance of a 1 MHz Nozzle System in Megasonic Cleaning, Microelectron. Eng., 87:5-8 1512-1515.
Principal researcher in the Innovative Energy Machinery Research Division, Korea Institute of Machinery and Materials, and a Professor in University of Science & Technology. His research interest is ultrasonic cleaning, megasonic cleaning and ultrasonic machining.
E-mail: hkim@kimm.re.kr
Principal technician in the Innovative Energy Machinery Research Division, Korea Institute of Machinery and Materials. His research interest is ultrasonic and megasonic cleaning.
E-mail: eslim@kimm.re.kr
Principal researcher in the Innovative Energy Machinery Research Division, Korea Institute of Machinery and Materials. His research interest is ultrasonic and megasonic cleaning.
E-mail: yllee@kimm.re.kr