[ Article ]

Journal of the Korean Society of Manufacturing Technology Engineers - Vol. 33, No. 4, pp.178-183

ISSN: 2508-5107 (Online)

Print publication date 15 Aug 2024

Received 02 Jun 2024 Revised 19 Jul 2024 Accepted 26 Jul 2024

DOI: https://doi.org/10.7735/ksmte.2024.33.4.178

CVD Chamber의 Gas 확산에 대한 수치해석적 연구

유승관^a ; 김승모^a^{, *}

Numerical Analysis of Gas Diffusion in CVD Chambers

Seoung Kwan You^a ; Seung Mo Kim^a^{, *}

aSchool of Mechanical Engineering, Korea University of Technology and Education

Correspondence to: ^*Tel.: +82-41-560-1159 E-mail address: smkim@koreatech.ac.kr (Seung Mo Kim).

Abstract

In this study, a numerical simulation is performed to analyze the structural nonuniformity caused by the wafer gate in a chemical vapor deposition (CVD) chamber. The effect of the process gap on the O₃ mole fraction, flow velocity, and wall shear stress is investigated. Increasing the gap improves the wafer surface uniformity from 0.138% to 0.122% as the gap approaches 50 mm. The difference in the O₃ mole fraction at the gate is minimal, thus signifying mild diffusion. The wall shear stress increases up to 3.91 times at the gate floor under wider gaps, whereasit decreases by 6% on the wafer. A wider gap decreases the deposition rate but enhances the cleaning efficiency. To reduce nonuniformity, a process gap of 10 mm or less is recommended for CVD processes, whereas a gap of 50 mm or more significantly improves cleaning efficiency.

Keywords:

Process gap, CVD chamber, Gas mixing, Showerhead, Uniformity, CFD

Acknowledgments

본 연구는 산업통상자원부와 한국산업기술기획평가원의 지원(20021828)과 2023년도 한국기술교육대학교 교육연구진흥과제의 연구비 지원으로 연구되었음.

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Seoung Kwan You

Ph.D. Candidate in the Department of Mechanical Engineering, Korea University of Technology and Education. His research interest is Semiconductor and Fluid Dynamics.

E-mail: soongan@koreatech.ac.kr

Seung Mo Kim

Professor in the Department of Mechanical Engineering in Korea University of Technology and Education. His research interests are Computational Fluid Dynamics in Semiconductor Equipment.

E-mail: smkim@koreatech.ac.kr